A smooth pillar, 0.7 �m in diameter and 4 �m deep, with vertical, no sidewall roughness, has been formed. Also, there is no roughness at the bottom.
This process can be applied to semiconductor lasers and photonic crystals.
A smooth pillar, 0.7 �m in diameter and 4 �m deep, with vertical, no sidewall roughness, has been formed. Also, there is no roughness at the bottom.
This process can be applied to semiconductor lasers and photonic crystals.